Research Grade Magnetron Sputtering Equipment
The equipment is a highly integrated and intelligent scientific research magnetron sputtering equipment, which can realize co-sputtering and reactive sputtering schemes, and can be used to prepare high-quality metal films, semiconductor films, dielectric films, insulating materials films, composite films, multi-layer heterojunction, etc.
Advantages
1.High aspect ratio cavity, increase sample uniformity, optional metal, organic materials.
2.Fully automatic touch screen control system can set and store multiple programs.
3.Complete safety design, simple maintenance, stable performance.
Technical Parameter
| Exhaust rate | From ATM to 1E-7Torr<20min (loadlock) |
| Wafer heating | RT-900 º C |
| Wafer adjustment | The distance between the substrate and the target material can be continuously adjusted |
| Wafer Transfer | Highly Reliable and Repeatable Wafer Transfer Capability |
| Control system | Fully automated human-machine interface |
| Safety | Industrial standard safety interlock, alarm |
