Pulsed Laser Deposition
Pulsed Laser Deposition (PLD) systems are widely used in universities and research institutes for depositing oxide and multicomponent thin films. Featuring simple operation, high reliability, and stable performance, these systems enable high-quality film growth with atomic-scale precision and control when integrated with RHEED and excimer lasers.
Technical Parameters
| Wafer size | 2inch-4inch |
| Extreme vacuum | Better than 5*10^-8 mbar |
| Uniformity | better than ±2% |
| Heating Temperature | RT-900℃ |
| Heating method | radiation heating |
| Sample movement range | rotation |
| Target size | Six 1-inch or three 2-inch |
| Target platform movement range | revolution,rotation |
| Laser source | Excimer laser |
| High voltage differential RHEED | Optional |
