Three Heating Zone for Graphene Growth CVD System
It is a dynamic chemical vapor deposition system composed of a three temperature zone vacuum rotary furnace, a three channel mass flow meter system, and a low vacuum unit. The three temperature zone open vacuum rotary tube furnace adopts a double-layer air-cooled structure, with a surface temperature of ≤ 60 ℃ on the furnace body. The furnace is formed by high-temperature vacuum adsorption of high-purity alumina microcrystalline fibers. Imported heating resistance wire inlay extends the service life of the furnace body. This equipment allows dynamic sintering of powder samples at high temperatures and is equipped with a magnetic fluid sealing device, allowing the entire equipment to operate in a vacuum state. The special sample chamber structure design avoids the tedious operations of traditional rotary furnace sampling. The rotary heating furnace, gas path control system, and vacuum constitute a vacuum rotary CVD system, which meets the sintering of samples under various experimental conditions such as vacuum or atmosphere. The process has good scalability and repeatability. It is an ideal equipment for processing materials under high temperature and vacuum addition in laboratories and industrial and mining enterprises of education institutions and research institutes.
| Model | CVD1200C-3ZLV-R-900D60III |
| Maximum temperature | 1,200 ℃ (short-term) |
| Rated temperature | 1,100 ℃ |
| Recommended heating rate | ≤10 ℃/min |
| Control precision | ±1 ℃ |
| Size of furnace tube | φ60*1400 mm |
| Heating zone length | 900mm |
| Heating element | Molybdenum doped iron chromium aluminum |
| Rated power | 7 KW |
| Temperature control | Fuzzy PID control and self-tuning regulation function Intelligent 30 segment programmable control Equipped with over temperature and couple breaking alarm functions Can install PC control software for real-time data collection |
